Institute for Materials and Manufacturing Research

MITEC Capabilities

Built on the foundation of Ohio State's extensive user facilities, MITEC integrates new capabilities across three interconnected platforms:
Researchers work in Ohio State's SEAL facility.

Epitaxial Growth: Four new 100 mm state-of-the-art epitaxial growth systems for III-Sb MBE, III-N MOCVD, and Ga₂O₃ MOCVD and HVPE, expanding the ability to explore next-generation semiconductor technologies. 

Device Fabrication: Select equipment to enhance and streamline nanofabrication at Nanotech West for critical processing gaps and accessible prototype development. 

Device Characterization: Five specialized electrical testbenches, spanning DC, RF, high-voltage, cryogenic, and epitaxial analysis, that enable researchers to characterize state of the art devices with industry level testing capabilities. 

These capabilities form a lab-to-fab pipeline, enabling prototype devices to be grown, fabricated, and tested on up to 100 mm wafers before transitioning to industry for advancing to higher technology and manufacturing readiness levels. MITEC also connects with Ohio State's other research facilities, providing members with an integrated set of tools for advancing microelectronics across a broad range of technologies and material systems.