Nanotech West Lab expanded their lithography capabilities in the Nanofabrication Lab with the addition of a new state-of-the-art Raith EBPG 5150 Plus electron beam lithography (EBL) system, which replaced the existing Raith/Leica EBPG 5000. The EBPG 5150 Plus was installed in November 2023 and open to users for training in February 2024. With resolution below 8nm and stitching and overlay (alignment) specs of better than 10nm, the new EBL far exceeds the capabilities of any other lithography tool at Nanotech West. In addition, the EBPG 5150 Plus has a dramatically higher maximum clock frequency of 125MHz as compared to the previous tool’s 10MHz. This in combination with the higher maximum available beam current, large 1mm field size, and improved universal pattern generator allow for 2-10x faster write times with improved pattern resolution and fidelity.
Access to Genisys’ Beamer and Tracer software was included with the EBL purchase, enabling users to fully optimize the EBPG 5150 Plus. Beamer enhances devices requiring low pattern line edge roughness, such as photonic waveguides and gratings, while 3D proximity effect correction optimizes structures like gamma and t-gates. The Raith universal pattern generator allows true curves and arbitrary angles, significantly improving pattern fidelity for designs involving curved features, dots, and ellipses, moving beyond the limitations of Manhattan geometries.
The EBPG 5150 Plus utilizes a graphical user interface operating on a Linux platform which significantly improves the user experience as compared to the previous tool’s command line interface. Training time is improved, and more users can operate the tool independently. Further improvements are planned to the pre-alignment microscope and training tools, which will facilitate larger group training, education, and outreach opportunities. The EBL is available to Nanotech West Nanofab users for training and operation. The EBPG 5150 Plus was funded by a Major Research Instrumentation (MRI) Award from the National Science Foundation, led by principal investigator Siddharth Rajan, professor in Electrical & Computer Engineering and Materials Science & Engineering.
Additionally, the installation of a new Plasma Therm Takachi ICP-RIE expanded etching capabilities with enhanced gas options and sample temperature control, ranging from -20°C to 250°C. The inclusion of the X-Celeprint Micro-Transfer Printer allows researchers to assemble diverse semiconductor devices on various substrates, complementing IMR’s heterogeneous epitaxy portfolio. This allows multiple approaches for creating advanced materials and devices through direct epitaxy and micro-transfer printing.