New Atomic Layer Deposition System Qualified and Available for Use

ORISadmin Facilities

atomic1The OSU Nanotech West Laboratory (NTW) has installed and completed qualification of a new Atomic Layer Deposition (ALD) system in the NTW cleanroom that is now available for general use. Purchased by the Ohio Wright Center for Photovoltaics Innovation and Commercialization (PVIC), the Picosun SUNALE™ R-150B ALD system provides a new synthesis capability for conformal thin film coatings of a variety of oxides, nitrides, sulfides and pure metals for passivation, optical coatings, metal electrodes, high-k dielectrics, etc. The SUNALE™ ALD system can use liquid, solid and gaseous precursors and can deposit on samples up to 150mm in diameter and in excess of 1 inch thick with excellent thickness uniformity with a 1σ variation of less than 1% demonstrated over a 150mm substrate.

The ALD system currently has standard processes for the deposition of Al2O3 and Ta2O5. Additional qualified processes to deposit materials such as ZnO, TiO2 and HfO2 are currently being developed and will soon be added to the set of standard ALD materials. However, as the ALD technique is designed to deposit a wide range of materials that depends upon availability of chemical precursors, users with interests outside the standard materials set are strongly encouraged to test additional precursors with the assistance of NTW and IMR staff.

To schedule training to use the ALD system or for further inquiries about the new ALD capabilities, please contact IMR Member of Technical Staff, Dr. John Carlin at For usage rates for the ALD system, go to “User Fees” at .