IMR Welcomes Newest Member of Technical Staff – John Carlin

ORISadmin General

IMR is pleased to welcome its second IMR Member of Technical Staff, Research Scientist Dr. John Carlin, to our community. John is no stranger to OSU as he is a 2001 PhD graduate who performed research on III-V compound semiconductor epitaxy and device processing during his graduate school days. From 2001-2004 he was a project manager and researcher at Amberwave Systems Corporation in charge of chemical vapor deposition for SiGe materials and strained Si devices. After a short stint in the research and development of gallium nitride (GaN) for light emitting diodes at Cree Inc., John became a Research Scientist in the Materials and Manufacturing Directorate at AFRL in Dayton, Ohio where he worked on wafer bonding, epitaxy and characterization of GaN and other III-V materials and continued to obtain significant experience in contract-oriented research.

We are delighted to have recruited John to IMR with his more than 10 years of very relevant experience. John will be in charge of the new III-V Metalorganic Chemical Vapor Deposition (MOCVD) laboratory and user facility that will be placed at Nanotech West Laboratory in 2008 as part of IMR’s Wright Center on Photovoltaics Innovation and Commercialization (WCI-PVIC). Key among John’s roles as IMR’s newest member will be facilitating collaborations via the MOCVD and device fabrication labs, bringing new industrial users to our facilities, and creating research partnerships and third party funding opportunities. John will play a major role in the PVIC Wright Center by assisting Bob Davis regarding PVIC activities within Nanotech West.

John joins IMR Senior Research Associate Aimee Bross, who operates the electron beam lithography facility which is set to move to Nanotech West Laboratory, 1381 Kinnear Road. John’s office is located in the IMR Suite in room 218 at Nanotech West. He can be reached by phone at 292-6112 or by email at carlin.9@osu.edu.