IMR Technical Staff Bios
Aimee Bross, Senior Research Associate 
Aimee Bross is a Senior Research Associate with IMR who assists users with nanofabrication, specifically lithography processing on the OSU Vistec EBPG-5000 electron beam nanolithography tool. She also trains and assists users on other processes and tools including the Zeiss Ultra Plus low-energy field emission scanning electron microscope. Aimee works with users to define processes consistent with each material system’s unique challenges from pattern design and lithography to pattern transfer.
Aimee has worked in this capacity for Ohio State since September 2005, and was an electron beam lithography engineer for TriQuint Semiconductor Texas for five years before moving to Columbus. She is currently pursuing a Masters degree in Electrical and Computer Engineering from Ohio State, and received her Bachelor of Science in Chemistry with an emphasis on physical surface chemistry from Penn State. Aimee is an avid runner and athlete and has completed several marathons.
John Carlin, Ph.D., Research Scientist 
Dr. John Carlin works in the Nanotech West Laboratory where he leads the new atomic layer deposition (ALD) and III-V metal organic chemical vapor deposition (MOCVD) efforts for IMR and the Wright Center for Photovoltaic Innovation and Commercialization (PVIC). In addition to material synthesis of metal-oxides, metal-nitrides and arsenide, phosphide and antimonide based III-V semiconductors, John assists the OSU materials community with processing and electrical and structural characterization of materials and devices.
John received his Bachelors, Masters, and Ph.D. degrees in Electrical and Computer Engineering from The Ohio State University. Before John joined IMR in November 2007, he worked as a research scientist and engineering consultant for AmberWave Systems, CREE, Inc. and PetroNu Engineering. John returned to Ohio State in August 2005 as a Research Scientist coordinating joint research projects between OSU and the Air Force Research Laboratory in the area of heterogeneous material integration.
Denis V. Pelekov, Ph.D., Research Scientist 
Dr. Denis V. Pelekhov is the Director of the ENCOMM NanoSystems Laboratory (ENSL) of the Center for Electronic & Magnetic Nanoscale Composite Multifunctional Materials (ENCOMM) which is located in the Physics Research Building on OSU’s Columbus campus. ENSL is a user facility with the goal of providing academic and industrial users with access to advanced material characterization and fabrication tools for research and development applications. Denis assists the OSU materials community with the application of various material characterization and fabrication techniques, including Focused Ion Beam/Scanning Electron Microscopy, X-ray diffractometry, SQUID magnetometry, Atomic Force/Magnetic Force microscopy, EDS X-ray microanalysis, Langmuir-Blodgett trough monolayer deposition and e-beam lithography.
Denis received his M.S. in 1992 from the Moscow State University (Moscow, Russia) and his Ph.D. in 1997 from Dartmouth College (Hanover, NH) with Geoffrey Nunes for developing a millikelvin atomic force microscope for the investigation of mesoscopic devices. After graduation he continued his scientific career as a Postdoctoral Research Associate at Los Alamos National Laboratory (Los Alamos, NM), where he became a Technical Staff Member in 2000. His primary research objective at Los Alamos was the development of Magnetic Resonance Force Microscopy (MRFM). In 2002 he accepted a position of a Research Scientist at the Ohio State University (OSU) where he continued his work on MRFM. Since 2007 he is also a Director of the ENCOMM NanoSystems Laboratory (ENSL) at OSU. His current research interests are focused on developing and applying high sensitivity scanned probe microscopy, including Magentic Resonance Force Microscopy and Magnetic Force Microscopy, for the study of various multi-component systems.